Harold Anderson, associate professor emeritus of Chemical and Nuclear Engineering in the University of New Mexico School of Engineering, died Jan. 29, 2015.
Anderson joined the UNM faculty in 1981 and taught in the chemical engineering program until he retired in 2006. He was responsible for developing courses in the area of semiconductor manufacturing that helped to broaden the chemical engineering curriculum at the graduate and undergraduate levels.
His research was in the area of plasma processing of semiconductor materials with emphasis on development of sensors and diagnostic technologies. Anderson was active in the American Vacuum Society, the American Physical Society and the Electrochemical society. He is well-known for his work on plasma diagnostics which was presented on multiple occasions at the Gaseous Electronics Conference.
A memorial service is planned for later this spring. For information about the service, contact Cheryl Brozena at email@example.com, who can also relay messages to his family.